Two-photon lithography (TPL) enables the development of a multifunctional materials platform that combines mechanical strength and optical activity, all contained in three-dimensional nanoarchitected ...

Lawrence Livermore National Laboratory (LLNL) engineers and scientists, in collaboration with Stanford University, have demonstrated a breakthrough 3D nanofabrication approach that transforms ...

Researchers have created a new type of epoxy photoresist that greatly improves the speed and detail of two-photon laser writing. This new material can write at a speed of 100 mm/s and can create tiny ...

Multiphoton lithography (often called multiphoton 3D lithography) is an additive manufacturing approach for fabricating intricate micro- and nanostructures. It relies on nonlinear optical absorption, ...

Tiny metalenses split a laser into 120,000+ points, letting 3D nanoprinting cover wafer-size areas with 113 nm detail at 1,000x speed. (Nanowerk News) Lawrence Livermore National Laboratory (LLNL) ...

Precision alignment in semiconductor lithography demands nanometer-scale accuracy, as even minor misalignments between the mask and wafer can drastically impact chip yield. However, existing optical ...