Abstract: Nanosheet FETs (NSFETs) are considered promising candidates to replace FinFETs as the dominant devices in sub-5-nm processes. To encourage further research into NSFET-based integrated ...
Abstract: In this article, we introduce the first European open source process design kit (PDK), namely IHP-Open130-G2. We provide a concise history of the PDK itself and offer a brief comparison with ...